US PATENT SUBCLASS 216 / 57
GAS PHASE AND NONGASEOUS PHASE ETCHING ON THE SAME SUBSTRATE

Current as of: June, 1999
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216 /   HD   ETCHING A SUBSTRATE: PROCESSES

57GAS PHASE AND NONGASEOUS PHASE ETCHING ON THE SAME SUBSTRATE

DEFINITION

Classification: 216/57

GAS PHASE AND NONGASEOUS PHASE ETCHING ON THE SAME SUBSTRATE:

(under the class definition) Process involving etching a substrate with a plurality of etchants and wherein at least one of the etchants is in a nongaseous phase and at least one of the etchants is in the gas phase.

(1) Note. See the Glossary for a definition of the term Gas.

(2) Note. Most of the patents relating to nongaseous etching involve a liquid etchant. See the Glossary for a definition of the term liquid.

SEE OR SEARCH THIS CLASS, SUBCLASS:

58, for gas phase etching.

83, for nongaseous phase etching