FORMING OR TREATING MASK USED FOR ITS NONETCHING FUNCTION(E.G., SHADOW MASK, X-RAY MASK, ETC.):
(under the class definition) Process wherein etching is used in forming or treating a mask whose function is other than as an etch mask or etch resist, e.g., shadow mask, X-ray mask, etc.
SEE OR SEARCH THIS CLASS, SUBCLASS:
41+, for the masking of a substrate using an etch resist.
56, for making a porous or perforated article not used for masking.
SEE OR SEARCH CLASS
378, X-Ray or Gamma Ray Systems or Devices,
35, for mask used in a nonetching function. 430, Radiation Imagery Chemistry: Process, Composition, or Product Thereof,
5, for a radiation mask produced by a photos:graphic step.
