US PATENT SUBCLASS 204 / 298.11
.~.~.~ Specified mask, shield or shutter

Current as of: June, 1999
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204 /   HD   CHEMISTRY: ELECTRICAL AND WAVE ENERGY

193  DF  APPARATUS {5}
298.01  DF  .~ Coating, forming or etching by sputtering {2}
298.02  DF  .~.~ Coating {13}
298.11.~.~.~ Specified mask, shield or shutter

DEFINITION

Classification: 204/298.11

Specified mask, shield or shutter:

(under subclass 298.02) Apparatus including significant specified means for masking, shielding or shuttering of electrodes or workpieces.

(1) Note. Apparatus in which masking, shielding or shuttering means are merely nominally specified are not included herein.