US PATENT SUBCLASS 204 / 298.07
.~.~.~ Specified gas feed or withdrawal

Current as of: June, 1999
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204 /   HD   CHEMISTRY: ELECTRICAL AND WAVE ENERGY

193  DF  APPARATUS {5}
298.01  DF  .~ Coating, forming or etching by sputtering {2}
298.02  DF  .~.~ Coating {13}
298.07.~.~.~ Specified gas feed or withdrawal

DEFINITION

Classification: 204/298.07

Specified gas feed or withdrawal:

(under subclass 298.02) Apparatus including significant specified means for feeding or withdrawing reactive or inert gases from the coating chamber.

(1) Note. Apparatus in which gas feed or withdrawal means are merely nominally specified are not included herein.