118 / | HD | COATING APPARATUS |
715 | DF | GAS OR VAPOR DEPOSITION {9} |
722 | DF | .~ With treating means (e.g., jarring) {2} |
723 R | DF | .~.~ By creating electric field (e.g., gas activation, plasma, etc.) {8} |
723 MW | DF | .~.~.~ Microwave gas energizing means (e.g., 2.45 gigahertz, microwave plasma, etc.) {3} |
723 ME | DF | .~.~.~.~ Producing energized gas remotely located from substrate {1} |
723 MR | .~.~.~.~.~ With magnet (e.g., electron cyclotron resonance, etc.) |