118 / | HD | COATING APPARATUS |
715 | DF | GAS OR VAPOR DEPOSITION {9} |
722 | DF | .~ With treating means (e.g., jarring) {2} |
723 R | DF | .~.~ By creating electric field (e.g., gas activation, plasma, etc.) {8} |
723 MP | ![]() | .~.~.~ Multiple gas energizing means associated with one deposition site (i.e., excluding substrate heater as an energizing means) |