US PATENT SUBCLASS 117 / 101
.~.~ Characterized by specified crystallography or arrangement of substrate (e.g., wafer cassette, Miller index)

Current as of: June, 1999
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117 /   HD   SINGLE-CRYSTAL, ORIENTED-CRYSTAL, AND EPITAXY GROWTH PROCESSES; NON-COATING APPARATUS THEREFOR

84  DF  FORMING FROM VAPOR OR GASEOUS STATE (E.G., VPE, SUBLIMATION) {8}
88  DF  .~ With decomposition of a precursor (except impurity or dopant precursor) composed of diverse atoms (e.g., CVD) {8}
101.~.~ Characterized by specified crystallography or arrangement of substrate (e.g., wafer cassette, Miller index)

DEFINITION

Classification: 117/101

Characterized by specified crystallography or arrangement of substrate (e.g., wafer cassette, Miller index):

(under subclass 88) Subject matter in which (a) the arrangement of the substrate is specified, for example a wafer cartridge or tray or a bank of wafers, or (b) the crystallography of the substrate is specified; e.g., crystal lattice orientation, Miller index.

(1) Note. Cross-referencing to art collection 902 is precluded as unnecessarily duplicative.