US PATENT SUBCLASS 65 / 29.18-- .~.~ Magnetic, electromagnetic, or wave energy utilized (e.g., light, infrared, ultrasonic, etc.)

US PATENT SUBCLASS 65 / 29.18
.~.~ Magnetic, electromagnetic, or wave energy utilized (e.g., light, infrared, ultrasonic, etc.)

Current as of: June, 1999
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65 /	HD	GLASS MANUFACTURING

17.1	DF	PROCESSES {32}
29.12	DF	.~ With measuring, sensing, inspecting, indicating, or testing {7}
29.18		.~.~ Magnetic, electromagnetic, or wave energy utilized (e.g., light, infrared, ultrasonic, etc.)

DEFINITION

Classification: 65/29.18

Magnetic, electromagnetic, or wave energy utilized (e.g., light, infrared, ultrasonic, etc.):

(under subclass 29.12) Processes combined with the use of magnetic, electromagnetic radiation, wave, sonic, or ultrasonic energy during any stage of forming or treating the glass.

(1) Note. Electromagnetic radiation includes: (a) Gamma rays; (b) X-rays; (c) Atomic particles (i.e., alpha rays, beta rays, electrons); (d) Ultraviolet rays; (e) Visible rays; (f) Infrared rays; (g) Actinic; (h) Laser; (i) Microwave; (j) Radio wave. This list is not intended to be exhaustive and is not limited to the above examples.