US PATENT SUBCLASS 526 / 292.95
.~.~.~ Halogen monomer contains a carboxylic acid, salt, or carboxylic acid amide


Current as of: June, 1999
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526 /   HD   SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES

*  DD  SYNTHETIC RESINS (Class 520, Subclass 1) {8}
72  DF  .~ POLYMERS FROM ONLY ETHYLENIC MONOMERS OR PROCESSES OF POLYMERIZING, POLYMERIZABLE COMPOSITIONS CONTAINING ONLY ETHYLENIC MONOMERS AS REACTANTS OR PROCESSES OF PREPARING {43}
291  DF  .~.~ From halogen containing monomer having at least three carbon atoms {7}
292.95.~.~.~ Halogen monomer contains a carboxylic acid, salt, or carboxylic acid amide


DEFINITION

Classification: 526/292.95

Halogen monomer contains a carboxylic acid, salt, or carboxylic acid amide:

(under subclass 291) Subject matter wherein said halogen-containing monomer contains a free carboxylic acid, salt, or carboxylic acid amide group.

SEE OR SEARCH CLASS

520, Synthetic Resins or Natural Rubbers, Glossary, under "carboxylic acid or derivative", see definitions of "carboxylic acid", "salt of a carboxylic acid", and "carboxylic acid amide".