US PATENT SUBCLASS 526 / 291
.~.~ From halogen containing monomer having at least three carbon atoms

Current as of: June, 1999
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526 /   HD   SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES

*  DD  SYNTHETIC RESINS (Class 520, Subclass 1) {8}
72  DF  .~ POLYMERS FROM ONLY ETHYLENIC MONOMERS OR PROCESSES OF POLYMERIZING, POLYMERIZABLE COMPOSITIONS CONTAINING ONLY ETHYLENIC MONOMERS AS REACTANTS OR PROCESSES OF PREPARING {43}
291.~.~ From halogen containing monomer having at least three carbon atoms {7}
292.1  DF  .~.~.~> Halogen monomer is carboxylic acid ester {6}
292.8  DF  .~.~.~> Halogen monomer is nitrile
292.9  DF  .~.~.~> Halogen monomer contains an ether group
292.95  DF  .~.~.~> Halogen monomer contains a carboxylic acid, salt, or carboxylic acid amide
293  DF  .~.~.~> Aromatic
294  DF  .~.~.~> Plural halogen atom
295  DF  .~.~.~> Plural ethylenic groups

DEFINITION

Classification: 526/291

(under subclass 72) Subject matter wherein the unsaturated monomer contains at least one halogen atom and at least three carbon atoms.

SEE OR SEARCH THIS CLASS, SUBCLASS:

296, for an iodine or bromine-containing monomer, 1, 2-dichloroethylene, trichloroethylene, or tetrachloroethylene monomer.

343, for a polymer derived from vinylidene chloride.

344+, for a polymer derived from vinyl chloride.