US PATENT SUBCLASS 516 / 82
.~.~.~.~.~ The silica is formed or grown by reaction of alkali silicate and non-siliceous inorganic acid (e.g., H2SO4)

Current as of: June, 1999
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516 /   HD   COLLOID SYSTEMS AND WETTING AGENTS; SUBCOMBINATIONS THEREOF; PROCESSES OF

9  DF  CONTINUOUS LIQUID OR SUPERCRITICAL PHASE: COLLOID SYSTEMS; COMPOSITIONS CONTAINING AN AGENT FOR MAKING OR STABILIZING COLLOID SYSTEMS; PROCESSES OF MAKING OR STABILIZING COLLOID SYSTEMS; PROCESSES OF PREPARING THE COMPOSITIONS (E.G., THICKENING AGENT; PROTECTIVE COLLOID AGENT; COMPOSITION CONTAINING AN EMULSIFYING AGENT WITH NO DISPERSANT* DISCLOSED; ORGANIC LIQUID EMULSIFIED IN ANHYDROUS HF) {5}
77  DF  .~ Aqueous continuous liquid phase and discontinuous phase primarily solid (e.g., water based suspensions, dispersions, or certain sols*, of natural or synthetic ester-wax, beeswax, carnauba wax; or latex dispersion) {1}
78  DF  .~.~ The solid is primarily inorganic material (e.g., mercurous halide) {4}
79  DF  .~.~.~ The material primarily contains compound containing silicon covalently bonded to oxygen (e.g., aluminum silicate, clay) {2}
81  DF  .~.~.~.~ The material is substantially pure silica sol {6}
82.~.~.~.~.~ The silica is formed or grown by reaction of alkali silicate and non-siliceous inorganic acid (e.g., H2SO4)

DEFINITION

Classification: 516/82

The silica is formed or grown by reaction of alkali silicate and non-siliceous inorganic acid (e.g., H 2SO 4):

(under subclass 81) Subject matter in which said substantially pure silica is prepared by a reaction of alkali silicate and a non-siliceous inorganic* acid, such as, sulfuric acid.

SEE OR SEARCH THIS CLASS, SUBCLASS:

34, for colloid systems in which the continuous liquid phase is primarily organic* and the discontinuous phase is primarily inorganic* solid or semisolid material* which is primarily compounds containing both silicon and oxygen, both aluminum and oxygen, or combinations thereof, such as silica organosol*, silica alcosol, talc, and clay.

SEE OR SEARCH CLASS

65, Glass Manufacturing,

17.2, for processes of working or treating glass which includes a sol-gel route or liquid phase route procedure during any stage of working or treating glass.