US PATENT SUBCLASS 451 / 29
.~ Utilizing shield (mask or stencil)
Current as of:
June, 1999
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451 /
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ABRADING
28
DF
ABRADING PROCESS
{19}
29
.~ Utilizing shield (mask or stencil) {2}
30
DF
.~.~
> With in situ removal of nonresist portion of shield
31
DF
.~.~
> With preparation of shield
DEFINITION
Classification: 451/29
Utilizing shield (mask or stencil):
(under subclass 28) Method wherein an abradant-resist is relied on to define the work area and to protect underlying portions of the workpiece.
(1) Note. Included in this and indented subclasses is a process including application, formation, or modification of the resist on the work surface.
SEE OR SEARCH THIS CLASS, SUBCLASS:
445, for an accessory including an abrading shield, and see search notes thereunder.
SEE OR SEARCH CLASS
216, Etching a Substrate: Processes, particularly
41+, for a step in a chemical etching process of masking the substrate with an etch resist.
