US PATENT SUBCLASS 438 / FOR 456
STOICHIOMETRIC CONTROL OF HOST SUBSTRATE COMPOSITION (437/945)
Current as of:
June, 1999
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438 /
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SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS
FOR 456
STOICHIOMETRIC CONTROL OF HOST SUBSTRATE COMPOSITION (437/945)
DEFINITION
Classification: 438/FOR.456
STOICHIOMETRIC CONTROL OF HOST SUBSTRATE COMPOSITION:
Foreign art collection involving the regulation of the proportions of elements combined in a base substrate composition.
