US PATENT SUBCLASS 438 / FOR 435
HAVING SUBSTRATE OR MASK ALIGNING FEATURE (437/924)
Current as of:
June, 1999
Click
HD
for Main Headings
Click for
All Classes
Internet Version by
PATENTEC
© 1999
Terms of Use
438 /
HD
SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS
FOR 435
HAVING SUBSTRATE OR MASK ALIGNING FEATURE (437/924)
DEFINITION
Classification: 438/FOR.435
HAVING SUBSTRATE OR MASK ALIGNING FEATURE:
Foreign art collection involving novel lining up a base or mask with other structure features of the device.
