US PATENT SUBCLASS 438 / 975
SUBSTRATE OR MASK ALIGNING FEATURE
Current as of:
June, 1999
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SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS
975
SUBSTRATE OR MASK ALIGNING FEATURE
DEFINITION
Classification: 438/975
SUBSTRATE OR MASK ALIGNING FEATURE
Art collection involving the lining up of a mask or regions to be formed with structural features (e.g., indicia, marks, etc.) of the substrate.
