US PATENT SUBCLASS 438 / 975
SUBSTRATE OR MASK ALIGNING FEATURE


Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

975SUBSTRATE OR MASK ALIGNING FEATURE


DEFINITION

Classification: 438/975

SUBSTRATE OR MASK ALIGNING FEATURE

Art collection involving the lining up of a mask or regions to be formed with structural features (e.g., indicia, marks, etc.) of the substrate.