US PATENT SUBCLASS 438 / 971
STOICHIOMETRIC CONTROL OF HOST SUBSTRATE COMPOSITION
Current as of:
June, 1999
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SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS
971
STOICHIOMETRIC CONTROL OF HOST SUBSTRATE COMPOSITION
DEFINITION
Classification: 438/971
STOICHIOMETRIC CONTROL OF HOST SUBSTRATE COMPOSITION
Art collection involving the regulation of the proportions of elements combined in a base substrate composition.
