US PATENT SUBCLASS 438 / 906
CLEANING OF WAFER AS INTERIM STEP

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

906CLEANING OF WAFER AS INTERIM STEP

DEFINITION

Classification: 438/906

CLEANING OF WAFER AS INTERIM STEP:

Art collection involving cleaning a semiconductive wafer as a step between other processing steps.