US PATENT SUBCLASS 438 / 477
.~ By vapor phase surface reaction

Current as of: June, 1999
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438 /   HD   SEMICONDUCTOR DEVICE MANUFACTURING: PROCESS

471  DF  GETTERING OF SUBSTRATE {4}
477.~ By vapor phase surface reaction

DEFINITION

Classification: 438/477

By vapor phase surface reaction:

(under subclass 471) Process in which the substrate is treated with a reactive gas mixture which preferentially forms volatile compounds with the undesired impurities.