US PATENT SUBCLASS 430 / 323
.~.~ Including etching substrate

Current as of: June, 1999
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430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

269  DF  IMAGING AFFECTING PHYSICAL PROPERTY OF RADIATION SENSITIVE MATERIAL, OR PRODUCING NONPLANAR OR PRINTING SURFACE - PROCESS, COMPOSITION, OR PRODUCT {17}
322  DF  .~ Forming nonplanar surface {3}
323.~.~ Including etching substrate

DEFINITION

Classification: 430/323

Including etching substrate:

(under subclass 322) Processes wherein portions of the medium beneath an imaged layer in the medium are removed.