US PATENT SUBCLASS 430 / 312
.~.~ Including multiple resist image formation

Current as of: June, 1999
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430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

269  DF  IMAGING AFFECTING PHYSICAL PROPERTY OF RADIATION SENSITIVE MATERIAL, OR PRODUCING NONPLANAR OR PRINTING SURFACE - PROCESS, COMPOSITION, OR PRODUCT {17}
311  DF  .~ Making electrical device {3}
312.~.~ Including multiple resist image formation

DEFINITION

Classification: 430/312

Including multiple resist image formation:

(under subclass 311) Processes wherein the imaged medium is developed to form more than one resist image.

(1) Note. A resist image is an image formed by removal of portions of the imaged radiation-sensitive layer of the medium.

(2) Note. Processes found in this subclass include those wherein there are multiple imaging and developing steps; a single imaging and multiple developing step; or multiple imaging and single developing steps.