US PATENT SUBCLASS 430 / 263
.~.~.~ From ethylenically unsaturated monomer

Current as of: June, 1999
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430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

256  DF  STRIPPING PROCESS OR ELEMENT {3}
259  DF  .~ Element {3}
262  DF  .~.~ Stripping layer containing specified synthetic nonradiation sensitive polymer {1}
263.~.~.~ From ethylenically unsaturated monomer

DEFINITION

Classification: 430/263

From ethylenically unsaturated monomer:

(under subclass 262) Element wherein the polymer is derived from ethylenically unsaturated monomers, e.g., vinyl polymers, etc.