US PATENT SUBCLASS 430 / 262
.~.~ Stripping layer containing specified synthetic nonradiation sensitive polymer

Current as of: June, 1999
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430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

256  DF  STRIPPING PROCESS OR ELEMENT {3}
259  DF  .~ Element {3}
262.~.~ Stripping layer containing specified synthetic nonradiation sensitive polymer {1}
263  DF  .~.~.~> From ethylenically unsaturated monomer

DEFINITION

Classification: 430/262

Stripping layer containing specified synthetic nonradiation sensitive polymer:

(under subclass 259) Element wherein the stripping layer, i.e., a layer adapted to be stripped at its interface with another layer, comprises a specified synthetic polymer.