US PATENT SUBCLASS 427 / 593
.~.~ Vapor deposition employing resistance heating of substrate or coating material


Current as of: June, 1999
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427 /   HD   COATING PROCESSES

457  DF  DIRECT APPLICATION OF ELECTRICAL, MAGNETIC, WAVE, OR PARTICULATE ENERGY {15}
592  DF  .~ Resistance heating {2}
593.~.~ Vapor deposition employing resistance heating of substrate or coating material


DEFINITION

Classification: 427/593

Vapor deposition employing resistance heating of substrate or coating material:

(under subclass 592) Processes wherein a substrate is resistively heated and a coating material is applied as a vapor or gas, or a source material for vapor deposition is resistively heated.

(1) Note. Processes utilizing consumable electrodes to apply coating as vapor or gas, by resistance electrical energy are proper for this and indented subclasses.

(2) Note. Explosive or detonation vaporization for deposition, via resistance heating is properly classified here.

(3) Note. Processes wherein a rod, wire, or filament is wholly or partially vaporized and deposited on a substrate is

proper for this subclass.

SEE OR SEARCH THIS CLASS, SUBCLASS:

446, for explosive or detonation flame or plasma spray vaporization.

587, wherein a chemical vapor reaction occurs.