US PATENT SUBCLASS 427 / 581
.~ Chemical deposition from liquid contiguous with substrate via electron beam or light (e.g., photochemical liquid deposition, etc.)


Current as of: June, 1999
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427 /   HD   COATING PROCESSES

457  DF  DIRECT APPLICATION OF ELECTRICAL, MAGNETIC, WAVE, OR PARTICULATE ENERGY {15}
581.~ Chemical deposition from liquid contiguous with substrate via electron beam or light (e.g., photochemical liquid deposition, etc.)


DEFINITION

Classification: 427/581

Chemical deposition from liquid contiguous with substrate via electron beam or light (e.g., photochemical liquid deposition, etc.):

(under subclass 457) Processes wherein the deposition of a liquid coating is driven by either light energy or an electron beam. The liquid coating material must be contiguous with the substrate during the energy application.