US PATENT SUBCLASS 427 / 581 .~ Chemical deposition from liquid contiguous with substrate via electron beam or light (e.g., photochemical liquid deposition, etc.)
Current as of: June, 1999
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.~ Chemical deposition from liquid contiguous with substrate via electron beam or light (e.g., photochemical liquid deposition, etc.)
DEFINITION
Classification: 427/581
Chemical deposition from liquid contiguous with substrate via electron beam or light (e.g., photochemical liquid deposition, etc.):
(under subclass 457) Processes wherein the deposition of a liquid coating is driven by either light energy or an electron beam. The liquid coating material must be contiguous with the substrate during the energy application.