US PATENT SUBCLASS 427 / 526
.~.~ Nonuniform or patterned ion plating or ion implanting (e.g., mask, etc.)


Current as of: June, 1999
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427 /   HD   COATING PROCESSES

457  DF  DIRECT APPLICATION OF ELECTRICAL, MAGNETIC, WAVE, OR PARTICULATE ENERGY {15}
523  DF  .~ Ion plating or implantation {8}
526.~.~ Nonuniform or patterned ion plating or ion implanting (e.g., mask, etc.)


DEFINITION

Classification: 427/526

Nonuniform or patterned ion plating or ion implanting (e.g. mask, etc.):

(under subclass 523) Processes wherein the ion plating or ion implanting (1) is applied only to selected portions of a substrate (2) is applied in such a manner as to produce a coating of uneven, discontinuous, or nonuniform thickness or (3) varies from area to area as to physical or chemical properties.

SEE OR SEARCH THIS CLASS, SUBCLASS:

256+, for nonuniform or patterned coating processes without the use of electrical, magnetic, electromagnetic, or wave energy.

448, for nonuniform or patterned spray coating processes utilizing flame or plasma heat.

466, for nonuniform or patterned coating processes utilizing electrostatic charge, field or force.

504, for processes to polymerize an applied nonuniform coating utilizing high energy electromagnetic radiation or high energy particles.

510, for processes to polymerize an applied nonuniform coating utilizing low energy electromagnetic radiation.

552, for nonuniform or patterned processes involving pretreating a substrate or post-treating a coated substrate utilizing high energy electromagnetic radiation or high energy particles.

555, for nonuniform or patterned coating processes utilizing laser radiation in a thermal pretreatment of a substrate or a thermal post-treatment of a coated substrate.

SEE OR SEARCH CLASS

430, Radiation Imagery Chemistry: Process, Composition, or Product Thereof,

31+, for coating processes involving electric or magnetic imagery.