US PATENT SUBCLASS 427 / 481
.~.~.~.~ Rotatable base or support for substrate

Current as of: June, 1999
Click HD for Main Headings
Click for All Classes

Internet Version by PATENTEC © 1999      Terms of Use


427 /   HD   COATING PROCESSES

457  DF  DIRECT APPLICATION OF ELECTRICAL, MAGNETIC, WAVE, OR PARTICULATE ENERGY {15}
458  DF  .~ Electrostatic charge, field, or force utilized {7}
475  DF  .~.~ Solid particles or atomized liquid applied {5}
477  DF  .~.~.~ Articles or substrates sequentially moved past atomizing source {4}
481.~.~.~.~ Rotatable base or support for substrate

DEFINITION

Classification: 427/481

Rotatable base or support for substrate:

(under subclass 477) Processes wherein mechanical means are

provided to convey the work (substrate or article) to be coated about a specified axis of rotation in which the path of every point of the moving work is an arc or circle, centered on that axis.