US PATENT SUBCLASS 427 / 481
.~.~.~.~ Rotatable base or support for substrate


Current as of: June, 1999
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427 /   HD   COATING PROCESSES

457  DF  DIRECT APPLICATION OF ELECTRICAL, MAGNETIC, WAVE, OR PARTICULATE ENERGY {15}
458  DF  .~ Electrostatic charge, field, or force utilized {7}
475  DF  .~.~ Solid particles or atomized liquid applied {5}
477  DF  .~.~.~ Articles or substrates sequentially moved past atomizing source {4}
481.~.~.~.~ Rotatable base or support for substrate


DEFINITION

Classification: 427/481

Rotatable base or support for substrate:

(under subclass 477) Processes wherein mechanical means are

provided to convey the work (substrate or article) to be coated about a specified axis of rotation in which the path of every point of the moving work is an arc or circle, centered on that axis.