US PATENT SUBCLASS 382 / 144
.~.~ Mask inspection (e.g., semiconductor photomask)
Current as of:
June, 1999
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382 /
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IMAGE ANALYSIS
100
DF
APPLICATIONS
{20}
141
DF
.~ Manufacturing or product inspection {5}
144
.~.~ Mask inspection (e.g., semiconductor photomask)
DEFINITION
Classification: 382/144
Mask inspection (e.g., semiconductor photomask):
(under subclass 141) Subject matter wherein photomasks for semiconductor or printed circuit board fabrication are scanned for defects, holes, etc.
