US PATENT SUBCLASS 349 / 4
.~.~ Exposure device for lithography

Current as of: June, 1999
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349 /   HD   LIQUID CRYSTAL CELLS, ELEMENTS AND SYSTEMS

1  DF  LIQUID CRYSTAL SYSTEM {9}
2  DF  .~ Liquid crystal for recording or imaging on photosensitive medium {2}
4.~.~ Exposure device for lithography

DEFINITION

Classification: 349/4

Exposure device for lithography:

(under subclass 2) Subject matter wherein the liquid crystal cell is used as an automatic or adjustable mask in forming high definition exposures on very small areas.

(1) Note. The liquid crystal cell forms the mask, not simply a shutter.