US PATENT SUBCLASS 250 / 492.21
.~.~ Ion bombardment

Current as of: June, 1999
Click HD for Main Headings
Click for All Classes

Internet Version by PATENTEC © 1999      Terms of Use


250 /   HD   RADIANT ENERGY

492.1  DF  IRRADIATION OF OBJECTS OR MATERIAL {2}
492.2  DF  .~ Irradiation of semiconductor devices {4}
492.21.~.~ Ion bombardment

DEFINITION

Classification: 250/492.21

Ion bombardment:

(under subclass 492.2) Subject matter comprising a means for irradiating a semiconductive object or material with at least one ion beam.

(1) Note. This subclass provides, for example, for ion implantation, etching, and scanning or deflection of ions on said object.

SEE OR SEARCH THIS CLASS, SUBCLASS:

398, for deflection or focussing of charged particles onto an object.

423, for ion sources.

492.1, for irradiation with ultraviolet or infrared sources.

492.2, for irradiation directly by electrons including photoemissive electrons. SEE OR SEARCH CLASS

378, X-Ray or Gamma Ray Systems or Devices,

34, for X-ray lithography.