US PATENT SUBCLASS 149 / 19.6-- .~.~.~.~ Resin contains oxirane groups or interunit ether linkages

US PATENT SUBCLASS 149 / 19.6
.~.~.~.~ Resin contains oxirane groups or interunit ether linkages

Current as of: June, 1999
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149 /	HD	EXPLOSIVE AND THERMIC COMPOSITIONS OR CHARGES

2	DF	STRUCTURE OR ARRANGEMENT OF COMPONENT OR PRODUCT {4}
17	DF	.~ Solid particles dispersed in solid solution or matrix {1}
18	DF	.~.~ Continuous phase contains organic material {2}
19.1	DF	.~.~.~ Organic material contains polysaccharide resin or synthetic resin {8}
19.6		.~.~.~.~ Resin contains oxirane groups or interunit ether linkages {1}
19.7	DF	.~.~.~.~.~> Polysaccharide or derivative thereof {1}

DEFINITION

Classification: 149/19.6

(under subclass 19.1) Products wherein either (1) the resin contains more than one oxirane group or (2) the interunit linkages of a recurring group within the backbone chain of the resin is an ether linkage.

SEE OR SEARCH CLASS

516, Colloid Systems and Wetting Agents; Subcombinations Thereof; Processes of Making, Stabilizing, Breaking, or Inhibiting,

98+, for colloid systems of continuous or semicontinuous solid phase with discontinuous liquid phase (gels, pastes, flocs, coagulates) or agents for such systems or making or stabilizing such systems or agents, when generically claimed or when there is no hierarchically superior provision in the USPC for the specifically claimed art.