| 117 / | HD | SINGLE-CRYSTAL, ORIENTED-CRYSTAL, AND EPITAXY GROWTH PROCESSES; NON-COATING APPARATUS THEREFOR |
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| 200 | DF | APPARATUS {4} |
| 206 | DF | .~ For crystallization from liquid or supercritical state {5} |
| 208 |  | .~.~ Seed pulling {7} |
| 209 | DF | .~.~.~> Including solid member shaping means other than seed or product (e.g., EDFG die) {2} |
| 213 | DF | .~.~.~> Including a sectioned crucible (e.g., double crucible, baffle) |
| 214 | DF | .~.~.~> Including details of precursor replenishment |
| 215 | DF | .~.~.~> Including sealing means details |
| 216 | DF | .~.~.~> Including a fully-sealed or vacuum-maintained crystallization chamber (e.g., ampoule) |
| 217 | DF | .~.~.~> Including heating or cooling details (e.g., shield configuration) |
| 218 | DF | .~.~.~> Including details of means providing product movement (e.g., shaft guides, servo means) |