US PATENT SUBCLASS 117 / 108
.~ Using an energy beam or field, a particle beam or field, or a plasma (e.g., MBE)

Current as of: June, 1999
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117 /   HD   SINGLE-CRYSTAL, ORIENTED-CRYSTAL, AND EPITAXY GROWTH PROCESSES; NON-COATING APPARATUS THEREFOR

84  DF  FORMING FROM VAPOR OR GASEOUS STATE (E.G., VPE, SUBLIMATION) {8}
108.~ Using an energy beam or field, a particle beam or field, or a plasma (e.g., MBE)

DEFINITION

Classification: 117/108

Using an energy beam or field, a particle beam or field, or a plasma (e.g., MBE):

(under subclass 84) Subject matter in which the process utilizes a particle beam or an energy beam or a particle field or an energy field or a plasma during growth.

(1) Note. Examples of subject matter proper for this subclass are: laser, electron, chemical, or molecular beams; plasma; or RF, magnetic, or electric fields.