US PATENT SUBCLASS 117 / 106
.~ With pretreatment or preparation of a base (e.g., annealing)


Current as of: June, 1999
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117 /   HD   SINGLE-CRYSTAL, ORIENTED-CRYSTAL, AND EPITAXY GROWTH PROCESSES; NON-COATING APPARATUS THEREFOR

84  DF  FORMING FROM VAPOR OR GASEOUS STATE (E.G., VPE, SUBLIMATION) {8}
106.~ With pretreatment or preparation of a base (e.g., annealing)


DEFINITION

Classification: 117/106

With pretreatment or preparation of a base (e.g., annealing):

(under subclass 84) Subject matter in which a base* is prepared or in which a base* is subject to treatment prior to single-crystal* growth.

(1) Note. Pretreatment includes: cleaning such as etching; heating (e.g., to evolve impurities); or coating (e.g., masking), including when such coating is a separate layer in the final product or is removed in a subsequent step or is one which is absorbed into the final product (e.g., an adherence enhancing coating).

(2) Note. Placement here is proper for claims directed to preparation of the base* when combined with a step of single-crystal* growth.

(3) Note. Not included as pretreatment are: merely heating up to operating temperature, or moving or positioning substrate or apparatus.

SEE OR SEARCH THIS CLASS, SUBCLASS:

89+, for processes involving pretreatment or preparation of the substrate and involving a decomposition reaction of a precursor*.

105, for processes which include a change in growth-influencing parameter during crystal growth (e.g., making superlattice, layers, junction).