US PATENT SUBCLASS 556 / 470
.~.~.~.~ Forming group containing silicon and carbon bonded directly to the same oxygen (e.g., esters, etc.)

Current as of: June, 1999
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556 /   HD   ORGANIC COMPOUNDS -- PART OF THE CLASS 532-570 SERIES

*  DD  ORGANIC COMPOUNDS (Class 532, Subclass 1) {3}
400  DF  .~ SILICON CONTAINING {19}
465  DF  .~.~ Carbon attached directly or indirectly to the silicon by nonionic bonding (e.g., silanes, etc.) {5}
466  DF  .~.~.~ Processes {8}
470.~.~.~.~ Forming group containing silicon and carbon bonded directly to the same oxygen (e.g., esters, etc.) {1}
471  DF  .~.~.~.~.~> A silicon halide reacted with a hydroxy or oxirane-containing compound (H of hydroxy may be replaced by a substituted or unsubstituted ammonium ion or a Group IA or IIA light metal)

DEFINITION

Classification: 556/470

(under subclass 466) Processes by which a group containing silicon and carbon bonded directly to the same oxygen is formed.

(1) Note. Included herein are those replacement reactions whereby one silicon-to-oxygen-to-carbon linkage is replaced by another such linkage.