US PATENT SUBCLASS 526 / 340.4
.~.~.~ Butadiene homopolymer contains at least 75% cis-1,4-configuration

Current as of: June, 1999
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526 /   HD   SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES

*  DD  SYNTHETIC RESINS (Class 520, Subclass 1) {8}
72  DF  .~ POLYMERS FROM ONLY ETHYLENIC MONOMERS OR PROCESSES OF POLYMERIZING, POLYMERIZABLE COMPOSITIONS CONTAINING ONLY ETHYLENIC MONOMERS AS REACTANTS OR PROCESSES OF PREPARING {43}
335  DF  .~.~ From hydrocarbon monomer containing at least two ethylenic groups, e.g., butadiene, etc. {9}
340.4.~.~.~ Butadiene homopolymer contains at least 75% cis-1,4-configuration

DEFINITION

Classification: 526/340.4

Butadiene homopolymer contains at least 75 percent cis-1, 4-configuration:

(under subclass 335) Subject matter wherein polybutadiene formed contains at least 75 percent cis-configuration.

(1) Note. Polymers produced with Group VIII transition metal catalysts are presumed to have 75 percent cis-1, 4-configuration in the absence of any disclosure to the contrary.