US PATENT SUBCLASS 526 / 229.5
.~.~.~.~.~ Nitrogen- or halogen-containing inorganic -0-0- compound free of sulfur, or wherein an -0-0- compound is in admixture with a compound devoid of sulfur and containing a N, halogen or P atom

Current as of: June, 1999
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526 /   HD   SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES

*  DD  SYNTHETIC RESINS (Class 520, Subclass 1) {8}
72  DF  .~ POLYMERS FROM ONLY ETHYLENIC MONOMERS OR PROCESSES OF POLYMERIZING, POLYMERIZABLE COMPOSITIONS CONTAINING ONLY ETHYLENIC MONOMERS AS REACTANTS OR PROCESSES OF PREPARING {43}
89  DF  .~.~ Polymerizing in the presence of a specified material other than monomer {28}
227  DF  .~.~.~ Material contains peroxy group compound (-O-O-) {8}
229  DF  .~.~.~.~ Inorganic peroxide, e.g., persulfate, hydrogen peroxide, etc. {1}
229.5.~.~.~.~.~ Nitrogen- or halogen-containing inorganic -0-0- compound free of sulfur, or wherein an -0-0- compound is in admixture with a compound devoid of sulfur and containing a N, halogen or P atom

DEFINITION

Classification: 526/229.5

Nitrogen- or halogen-containing inorganic -O-O- compound free of sulfur, or wherein an O-O- compound is in admixture with a compound devoid of sulfur and containing a N, halogen or P atom:

(under subclass 229) Subject matter wherein the -O-O- group is part of a sulfur-free inorganic nitrogen- or halogen-containing compound, or wherein an inorganic compound containing the -O-O- group is in admixture with a sulfur-free nitrogen, halogen, or phosphorus compound.