US PATENT SUBCLASS 526 / 214
.~.~.~.~ Derived from carboxylic acid containing at least one atom of halogen or sulfur

Current as of: June, 1999
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526 /   HD   SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES

*  DD  SYNTHETIC RESINS (Class 520, Subclass 1) {8}
72  DF  .~ POLYMERS FROM ONLY ETHYLENIC MONOMERS OR PROCESSES OF POLYMERIZING, POLYMERIZABLE COMPOSITIONS CONTAINING ONLY ETHYLENIC MONOMERS AS REACTANTS OR PROCESSES OF PREPARING {43}
89  DF  .~.~ Polymerizing in the presence of a specified material other than monomer {28}
213  DF  .~.~.~ Material contains carboxylic acid, salt, ester, or anhydride thereof {3}
214.~.~.~.~ Derived from carboxylic acid containing at least one atom of halogen or sulfur

DEFINITION

Classification: 526/214

(under subclass 213) Subject matter wherein the specified material contains (1) a halogen or sulfur substituted carboxylic acid; or (2) an ester, salt, or anhydride of a sulfuror halogen substituted carboxylic acid.