US PATENT SUBCLASS 525 / 111
.~.~.~.~ With reactant which is free of an 1,2-epoxy group and which contains a -N=C=X group or polymer thereof (X is chalcogen); or with a polyol and a polycarboxylic acid or reaction product thereof which is free of an 1,2 epoxy group

Current as of: June, 1999
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525 /   HD   SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES

*  DD  SYNTHETIC RESINS (Class 520, Subclass 1) {4}
50  DF  .~ MIXING OF TWO OR MORE SOLID POLYMERS; MIXING OF SOLID POLYMER OR SICP WITH SICP OR SPFI; MIXING OF SICP WITH AN ETHYLENIC AGENT; MIXING OF SOLID POLYMER WITH A CHEMICAL TREATING OR ETHYLENIC AGENT; OR PROCESSES OF FORMING OR REACTING; OR THE RESULTANT PRODUCT OF ANY OF THE ABOVE OPERATIONS {32}
55  DF  .~.~ At least one solid polymer derived from ethylenic reactants only {25}
107  DF  .~.~.~ With saturated 1,2-epoxy reactant containing more than one 1,2-epoxy group per mole or polymer derived therefrom; or with solid copolymer derived from at least one saturated reactant and at least one unsaturated 1,2-epoxy reactant wherein the epoxy reactant contains more than one 1,2-epoxy group per mole {16}
111.~.~.~.~ With reactant which is free of an 1,2-epoxy group and which contains a -N=C=X group or polymer thereof (X is chalcogen); or with a polyol and a polycarboxylic acid or reaction product thereof which is free of an 1,2 epoxy group

DEFINITION

Classification: 525/111

(under subclass 107) With reactant which is free of an 1, 2-epoxy group and which contains a -N=C=X group or polymer thereof (X is chalcogen); or with a polyol and a polycarboxylic acid or reaction product thereof which is free of an 1, 2-epoxy groups:Subject matter wherein there is an additional reactant present which is free of any 1, 2-epoxy group and which contains more than one -N=C=X (X is chalcogen) group or polymer thereof; or with a polyol and a polycarboxylic acid or derivative or with a reaction product thereof and which reactants or polymer are free of any 1, 2-epoxy groups, e.g., polyurethanes, polyesters, etc.