US PATENT SUBCLASS 524 / 210
.~.~.~.~.~.~ N-C=X group wherein X is a chalcogen


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524 /   HD   SYNTHETIC RESINS OR NATURAL RUBBERS -- PART OF THE CLASS 520 SERIES

*  DD  SYNTHETIC RESINS (Class 520, Subclass 1) {1}
*  DD  .~ PROCESSES OF PREPARING A DESIRED OR INTENTIONAL COMPOSITION OF AT LEAST ONE NONREACTANT MATERIAL AND AT LEAST ONE SOLID POLYMER OR SPECIFIED INTERMEDIATE CONDENSATION PRODUCT, OR PRODUCT THEREOF (Class 523, subclass 1) {17}
1  DF  .~.~ Adding a NRM to a preformed solid polymer or preformed specified intermediate condensation product, composition thereof; or process of treating or composition thereof {31}
80  DF  .~.~.~ DNRM which is other than silicon dioxide, glass, titanium dioxide, water, halohydrocarbon, hydrocarbon, or elemental carbon {4}
81  DF  .~.~.~.~ Organic DNRM {21}
186  DF  .~.~.~.~.~ Organo nitrogen compound other than unsubstituted ammonium salt as sole nitrogen atom DNRM {12}
210.~.~.~.~.~.~ N-C=X group wherein X is a chalcogen {10}
211  DF  .~.~.~.~.~.~.~> N-(C=X)N, e.g., urea, etc. {5}
217  DF  .~.~.~.~.~.~.~> N atom other than as part of a N-C=X group
218  DF  .~.~.~.~.~.~.~> C=X group other than as part of a N-C=X group {1}
220  DF  .~.~.~.~.~.~.~> C-O-C group
221  DF  .~.~.~.~.~.~.~> C-OH group {3}
225  DF  .~.~.~.~.~.~.~> Atom other than N, C, H, or oxygen
226  DF  .~.~.~.~.~.~.~> Carbocyclic group
227  DF  .~.~.~.~.~.~.~> Two or more N-C=O groups {1}
230  DF  .~.~.~.~.~.~.~> N-(C=O)alkyl wherein alkyl group contains eight or more carbon atoms {2}
233  DF  .~.~.~.~.~.~.~> Dialkyl amides, e.g., dimethyl formamide, dimethyl acetamide, etc. {2}


DEFINITION

Classification: 524/210

N-C=X group wherein X is a chalcogen:

(under subclass 186) Subject matter wherein the nitrogen compound contains at least one N-- group wherein X is a chalcogen atom.

(1) Note. Chalcogen is limited to oxygen, sulphur, selenium, and tellurium.