US PATENT SUBCLASS 510 / 176
.~.~.~ For stripping photoresist material

Current as of: June, 1999
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510 /   HD   CLEANING COMPOSITIONS FOR SOLID SURFACES, AUXILIARY COMPOSITIONS THEREFOR, OR PROCESSES OF PREPARING THE COMPOSITIONS

108  DF  CLEANING COMPOSITIONS OR PROCESSES OF PREPARING (E.G., SODIUM BISULFATE COMPONENT, ETC.) {21}
109  DF  .~ For cleaning a specific substrate or removing a specific contaminant (e.g., for smoker's pipe, etc.) {50}
175  DF  .~.~ For printed or integrated electrical circuit, or semiconductor device {2}
176.~.~.~ For stripping photoresist material

DEFINITION

Classification: 510/176

For stripping photoresist material:

(under subclass 175) Compositions specialized for stripping photoresist material.

(1) Note. This subclass is intended to encompass compositions used to remove photoresist material used in manufacturing printed circuits, once the resist material has fulfilled its function.