US PATENT SUBCLASS 430 / 536
.~.~.~ Polymer of unsaturated monomer

Current as of: June, 1999
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430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

495.1  DF  RADIATION SENSITIVE PRODUCT {7}
523  DF  .~ Identified backing or protective layer containing {5}
531  DF  .~.~ Synthetic resin or cellulose derivative containing {3}
536.~.~.~ Polymer of unsaturated monomer {1}
537  DF  .~.~.~.~> In nonradiation-sensitive layer including gelatin

DEFINITION

Classification: 430/536

Polymer of unsaturated monomer:

(under subclass 531) Subject matter wherein the synthetic resin is the addition polymer of an unsaturated monomer.