US PATENT SUBCLASS 430 / 299
.~ Simultaneous developing a resist image and etching a subtrate

Current as of: June, 1999
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430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

269  DF  IMAGING AFFECTING PHYSICAL PROPERTY OF RADIATION SENSITIVE MATERIAL, OR PRODUCING NONPLANAR OR PRINTING SURFACE - PROCESS, COMPOSITION, OR PRODUCT {17}
299.~ Simultaneous developing a resist image and etching a subtrate

DEFINITION

Classification: 430/299

Simultaneous developing a resist image and etching a substrate:

(under subclass 269) Processes wherein the image radiation-sensitive layer of the medium is developed to remove portions of the layer simultaneously with removal of portions of the medium beneath the imaged radiation-sensitive layer.

(1) Note. Simultaneously, for this subclass definition means that the developing and etching (removal) are performed concurrently in time.