US PATENT SUBCLASS 430 / 297
.~ Simultaneous radiation imaging and etching of substrate

Current as of: June, 1999
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430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

269  DF  IMAGING AFFECTING PHYSICAL PROPERTY OF RADIATION SENSITIVE MATERIAL, OR PRODUCING NONPLANAR OR PRINTING SURFACE - PROCESS, COMPOSITION, OR PRODUCT {17}
297.~ Simultaneous radiation imaging and etching of substrate

DEFINITION

Classification: 430/297

Simultaneous radiation imaging and etching of substrate:

(under subclass 269) Processes wherein radiation imaging of a radiation-sensitive layer of the medium is performed simultaneously with removal of portions of the medium beneath the imaged radiation-sensitive layer.

(1) Note. Simultaneously, for this subclass definition means that the radiation imaging and etching (removal) are performed concurrently in time.