US PATENT SUBCLASS 430 / 261
.~.~ Strippable between two radiation-sensitive layers

Current as of: June, 1999
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430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

256  DF  STRIPPING PROCESS OR ELEMENT {3}
259  DF  .~ Element {3}
261.~.~ Strippable between two radiation-sensitive layers

DEFINITION

Classification: 430/261

Strippable between two radiation-sensitive layers:

(under subclass 259) Elements adapted to be stripped between two electromagnetic sensitive layers.