US PATENT SUBCLASS 430 / 209
.~.~.~ Having specified trap

Current as of: June, 1999
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430 /   HD   RADIATION IMAGERY CHEMISTRY: PROCESS, COMPOSITION, OR PRODUCT THEREOF

199  DF  TRANSFER PROCEDURE BETWEEN IMAGE AND IMAGE LAYER, IMAGE RECEIVING LAYERS, OR ELEMENT CONTAINING AN IMAGE RECEIVING LAYER OR AN INGREDIENT FOR FORMING AN IMAGE RECEIVING LAYER {3}
202  DF  .~ Diffusion transfer process, element, or identified image receiving layers therefor {8}
207  DF  .~.~ Element structurally defined other than containing nominal processing composition container or trap, or containing processing composition container or trap made of identified material {3}
209.~.~.~ Having specified trap

DEFINITION

Classification: 430/209

Having specified trap:

(under subclass 107) Element having more than a broadly recited trap for retaining excess processing composition after application of the processing composition.