LIQUID SOURCE CHEMICAL VAPOR DEPOSITION (i.e., LSCVD) OR AEROSOL CHEMICAL VAPOR DEPOSITION (i.e., ACVD):
(under the class definition) Process which includes vaporizing a liquid material within a chemical vapor deposition chamber or reactor, wherein the vaporized liquid (per se or in aerosol form) contacts a heated substrate to thermally decompose, thereby forming a coating (film, layer, etc.) on the substrate surface.
(1) Note. This subclass is proper for heat decomposition of
liquid, vapor, or gas to form a coating on a base
SEE OR SEARCH THIS CLASS, SUBCLASS:
226, for using heat to decompose an existing coating on a base.
