US PATENT SUBCLASS 423 / 484
.~.~.~ From impure starting material

Current as of: June, 1999
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423 /   HD   CHEMISTRY OF INORGANIC COMPOUNDS

462  DF  HALOGEN OR COMPOUND THEREOF {10}
481  DF  .~ Hydrogen halide {4}
483  DF  .~.~ Hydrogen fluoride {1}
484.~.~.~ From impure starting material {1}
485  DF  .~.~.~.~> Fluorspar

DEFINITION

Classification: 423/484

(under subclass 483) Processes wherein the hydrogen fluoride is formed from an initial mixture containing an impurity.