US PATENT SUBCLASS 423 / 329.1
.~.~.~.~.~ X-ray diffraction pattern

Current as of: June, 1999
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423 /   HD   CHEMISTRY OF INORGANIC COMPOUNDS

324  DF  SILICON OR COMPOUND THEREOF {4}
325  DF  .~ Oxygen containing {2}
326  DF  .~.~ Metal containing (i.e., silicate) {3}
327.1  DF  .~.~.~ Aluminum containing {2}
328.1  DF  .~.~.~.~ Aluminosilicate {3}
329.1.~.~.~.~.~ X-ray diffraction pattern

DEFINITION

Classification: 423/329.1

X-ray diffraction pattern:

(under subclass 328.1) Products wherein the aluminosilicate structure is identified by a diffraction grating produced by an X-ray passing through it.

(1) Note. Original patents in this subclass require that an X-ray diffraction pattern be referenced in the claim.