US PATENT SUBCLASS 423 / 243.02-- .~.~.~ And addition of gaseous reactant

US PATENT SUBCLASS 423 / 243.02
.~.~.~ And addition of gaseous reactant

Current as of: June, 1999
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423 /	HD	CHEMISTRY OF INORGANIC COMPOUNDS

210	DF	MODIFYING OR REMOVING COMPONENT OF NORMALLY GASEOUS MIXTURE {11}
242.1	DF	.~ Sulfur or sulfur containing component {3}
243.01	DF	.~.~ Utilizing aqueous reactant to remove or modify sulfur or sulfur containing component {7}
243.02		.~.~.~ And addition of gaseous reactant {1}
243.03	DF	.~.~.~.~> Oxygen

DEFINITION

Classification: 423/243.02

And addition of gaseous reactant:

(under subclass 243.01) Process wherein a reactant is added that is in a gaseous state at ambient condition (e.g.,

NH₃, Cl₂).

(1) Note. Excluded from this subclass are those liquid reactants that have been formed by dissolved gases such as NH₄OH that have no specifically recited undissolved gaseous component.

SEE OR SEARCH THIS CLASS, SUBCLASS:

243.10, for those added components dissolved and forming ionic reactants, such as NH_{4[end subscrpt]OHNH₄[supscrpt]+[end supscrpt] OH[supscrpt]-[end supscrpt] in alkali or alkaline earth slurry or solution.}