US PATENT SUBCLASS 423 / 203
.~.~ Subjecting mixture to pressure, vacuum, or steam


Current as of: June, 1999
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423 /   HD   CHEMISTRY OF INORGANIC COMPOUNDS

1  DF  TREATING MIXTURE TO OBTAIN METAL CONTAINING COMPOUND {15}
179  DF  .~ Alkali metal (Li, Na, K, Rb, or Cs) {12}
203.~.~ Subjecting mixture to pressure, vacuum, or steam {2}
204  DF  .~.~.~> Mixture contains organic impurity
205  DF  .~.~.~> Leaching or forming water soluble substance


DEFINITION

Classification: 423/203

(under subclass 179) Processes wherein the reaction or heating takes place while the pressure on the mixture is either higher or lower than atmospheric, or wherein steam or water vapor is brought in contact with the mixture.

(1) Note. Pressure increase or decrease can be effected by any means, e.g., submerged blast of a gas into a liquid or slurry, pumping of the liquid or slurry, increase or decrease in pressure of the gas space above a liquid surface, etc.